Photoresist Emulsion for Direct Platemaking

Photoresist Emulsion for Direct Platemaking

● CAS: 95-65-8
● FORMULA: C8H10O

Product Introduction

After you confirm the order with us, 4-(N,N-Diphenylamino)benzaldehyde, 9-Anthraldehyde, Iron Chloride Hexahydrate will be delivered at the time negotiated by both parties by default. The delivery time is fast and the price is reasonable. We serve our customers wholeheartedly with excellent quality, short delivery time, dedicated service, and adhere to the service concept of 'cooperation and win-win'! We are willing to cooperate with business friends from at home and abroad, to create a great future. The introduction of strategic investment at the beginning of the year further enhanced the company's R&D strength and service capabilities. On the basis of fully absorbing foreign technology, we rely on science and technology for development.

3,4-Dimethylphenol

CAS: 95-65-8

FORMULA: C8H10O

STRUCTURE:

image


Product specification

Test

Specification

Appearance

White to pale yellow crystal

Assay

≥99%



We are committed to providing quality Photoresist Emulsion for Direct Platemaking and considerate services to customers at home and abroad. We maintain a partnership of equal trust and frank communication with our employees, and cultivate a team that is optimistic, pioneering, united and cooperative, and willing to contribute. We wholeheartedly welcome new and old customers, and are willing to cooperate loyally with you to create brilliance together!

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